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  1. Q. Cao, M. –G. Xia, M. Shim, J. Rogers, “Bilayer organic-inorganic gate dielectrics for high-performance, low-voltage, single-walled carbon nanotube thin-film transistors, complementary logic gates, and p-n diodes on plastic substrates,” Adv. Functional Mater. 16, 2355 – 2362 (2006). [doi: 10.1002/adfm.200600539]
  2. K. –W. Kwon, B. H. Lee, and M. Shim, “Structural Evolution in Metal Oxide/Semiconductor Colloidal Nanocrystal Heterostructures,” Chem. Mater. 18, 6357 – 6363 (2006). [DOI: 10.1021/cm0621390]
  3. J. H. Back and M. Shim, “pH-Dependent Electron Transport Properties of Carbon Nanotubes,” J. Phys. Chem. B 110, 23736 – 23741 (2006). [DOI: 10.1021/jp063260x]
  4. K. D. Matthews, M. G. Lemaitre, T. Kim, H. Chen, M. Shim, and J. –M. Zuo, “Growth Modes of Carbon Nanotubes on Metal Substrates,”J. Appl. Phys. 100, 044309 (2006). [doi: 10.1063/1.2219000]
  5. Shim, T. Ozel, A. Gaur, and C. Wang, “Insights on Charge Transfer Doping and Intrinsic Phonon Line Shape of Carbon Nanotubes by Simple Polymer Adsorption,” J. Am. Chem. Soc. 128, 7522 – 7530 (2006). [DOI: 10.1021/ja058551i]
  6. Kocabas, M. Shim, and J. A. Rogers, “Spatially Selective Guided Growth of High-Coverage Arrays and Random Networks of Single-Walled Carbon Nanotubes and Their Integration into Electronic Devices,” J. Am. Chem. Soc. 128, 4540 – 4541 (2006). [DOI: 10.1021/ja0603150]
  7. Q. Cao, Z. T. Zhu, M. G. Lemaitre, M. G. Xia, M. Shim, and J. A. Rogers, “Transparent flexible organic thin-film transistors that use printed single-walled carbon nanotube electrodes,” Appl. Phys. Lett. 88, 113511 (2006). [DOI:10.1021/ja0603150]
  8. Q. Cao, S. –H. Hur, Z. T. Zhu, Y. Sun, C. Wang, M. A. Meitl, M. Shim, and J. A. Rogers, “Highly Bendable, Transparent Thin-Film Transistors That Use Carbon-Nanotube-Based Conductors and Semiconductors with Elastomeric Dielectrics,” Adv. Mater. 18, 304 – 309 (2006). [DOI: 10.1002/adma.200501740]
  9. F. Hua, A. Gaur, Y. Sun, M. Word, J. Niu, I. Adesida, M. Shim, J. A. Rogers, and A. Shim, “Processing Dependent Behavior of Soft Imprint Lithography on the 1-10 nm Scale,” IEEE Trans. Nanotech. 5, 301 – 308 (2006). [DOI: 10.1109/TNANO.2006.874051]